Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1 - 50 out of 68,200

Document Document Title
WO/2021/086778A1
In an embodiment of the present ambient ionization experiment, the abundance of background chemicals relative to ions of interest is decreased by pulsing the carrier gas used to generate the excited species directed at the sample. The ex...  
WO/2021/084561A1
The present invention provides an apparatus for the deposition of thin films on a substrate, including large substrates, held preferably face-down, in a cartridge containing a liquid solution with at least a chemical precursor which, upo...  
WO/2021/087178A1
A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma...  
WO/2021/085913A1
The present invention relates to a coupling-type focus ring whereby the focus ring is separated into a plurality of portions and assembled so as to enable the replacement of only a portion which has been used up as a result of etching by...  
WO/2021/086354A1
A deposition system includes a multipurpose deposition chamber, a pretreatment source and a post-treatment source. The multipurpose deposition chamber is configured to deposit parylene on a plurality of electronic devices. The multipurpo...  
WO/2021/083773A1
A system for grounding a mask (50) using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong (52) ...  
WO/2021/084684A1
The present invention achieves increased brightness of electron beams emitted by a photoexcitation electron gun. An electron gun (15) comprises: a photocathode (1) having a substrate (11) and a photoelectric film (10); a light source (7)...  
WO/2021/085049A1
A charged particle beam device 1 comprises: a plurality of detectors 7 that detect signal particles 9 released by a sample 8 as a result of irradiation by a charged particle beam 3, and convert the particles into an output electrical sig...  
WO/2021/086570A1
Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondar...  
WO/2021/086691A1
Systems and methods for cleaning a showerhead are described. One of the systems includes a support section and a press plate located above the support section to be supported by the support section. The system further includes a cleaning...  
WO/2021/087014A1
A rendered image is aligned with a scanning electron microscope (SEM) image to produce an aligned rendered image. A reference image is aligned with the SEM image to produce an aligned reference image. A threshold probability map also is ...  
WO/2021/081804A1
The present invention provides a method for calibrating verticality of a particle beam. The method includes: providing a baseplate having a first sensor and a second sensor; emitting the particle beam to the first sensor of the baseplate...  
WO/2021/083581A1
The present invention relates to a 3D tomographic inspection method for the inspection of semiconductor features in an inspection volume of a semiconductor wafer. A 3D tomographic image is obtained and a plurality of 2D cross section ima...  
WO/2021/080281A1
The present invention relates to a method for forming a coating layer having plasma resistance. The method for forming a coating layer having plasma resistance according to the present invention is characterized by comprising: a substrat...  
WO/2021/081347A1
A duoplasmatron ion source with a partially ferromagnetic anode can be used in multiple applications, including the production of negative ions for secondary ion mass spectrometers and particle accelerators. A partially ferromagnetic ano...  
WO/2021/078445A1
A method of determining aberrations in images obtained by a charged particle beam tool, comprising the steps of: a) obtaining two or more images of a sample, wherein each image is obtained at a known relative difference in a measurement ...  
WO/2021/034569A3
Control system configured for sample tracking in an electron microscope environment registers a movement associated with a region of interest located within an active area of a sample under observation with an electron microscope. The re...  
WO/2021/080992A1
A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching n...  
WO/2021/080089A1
The present invention relates to a diagnostic method and apparatus for a non-invasive plasma process capable of monitoring a plasma process in real time by measuring a surface wave resonance frequency generated in a plasma-sheath on the ...  
WO/2021/081123A1
Methods, systems, and computer programs are presented for manufacturing a showerhead for a semiconductor manufacturing system. One method includes an operation for drilling first holes on a faceplate made of a first material, where the f...  
WO/2021/081304A1
Radio frequency power conveyed to individual process stations of a multi-station integrated circuit fabrication chamber may be adjusted so as to bring the rates at which fabrication processes occur, and/or fabrication process results, in...  
WO/2021/078352A1
A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate...  
WO/2021/081219A1
Embodiments of the present disclosure relate to articles, coated articles, and methods of coating such articles with a corrosion resistant coating. The corrosion resistant coating can comprise hafnium aluminum oxide. The corrosion resist...  
WO/2021/081387A1
Methods of depositing a film using a plasma enhanced process are described. The method comprises providing continuous power from a power source connected to a microwave plasma source in a process chamber and a dummy load, the continuous ...  
WO/2021/077981A1
A sample closure device for a scanning electron microscope, the sample closure device comprising: a cabin (10); an accommodating part (20) having an accommodating space for accommodating a sample, the accommodating part (20) being arrang...  
WO/2021/078819A1
An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavele...  
WO/2021/080718A1
A monitoring circuit that includes a pickup loop to monitor a voltage applied to a cavity of a linear accelerator is disclosed. The monitoring circuit is electrically isolated from the linear accelerator and is also electrically isolated...  
WO/2021/078442A1
So as to establish a desired distribution of partial gas pressure along a surface of a substrate (5) when vacuum treating such substrate a gas is fed towards the substrate (5) through openings (13) distributed all along the entire periph...  
WO/2021/080420A1
The invention relates to an apparatus and method for generating a plurality of substantially collimated charged particle beamlets. The apparatus comprises a charged particle source for generating a diverging charged particle beam, a beam...  
WO/2021/079855A1
The present invention provides a simpler method for sharpening the tip of an emitter. The present invention also provides an emitter having a nanoneedle which stably emits electrons with high efficiency and is formed from a single crysta...  
WO/2021/073811A1
The charged particle beam device (100) includes a charged particle source (105) and a beamlet-forming multiaperture plate (110). The device also includes a precompensator (120) for reducing aberrations of the beamlets at a target, a scan...  
WO/2021/076527A1
A dual-plenum fractal (DPF) showerhead for distributing different semiconductor processing gases across a semiconductor wafer during processing operations is provided. The DPF showerhead may have a plurality of layers, each featuring a p...  
WO/2021/073868A1
Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and...  
WO/2021/075000A1
The purpose of the present invention is to provide an efficient method of sticking a tissue slice. The present invention solves one problem by changing conditions of sticking a tissue slice according to the tissue slice derived from an o...  
WO/2021/074260A1
Systems and methods of profiling a charged-particle beam are disclosed. The method of profiling a charged-particle beam may comprise activating a charged-particle source to generate the charged-particle beam along a primary optical axis,...  
WO/2021/074957A1
This data processing device processes original data having data values associated with combinations of a first variable, a second variable, a third variable, and a fourth variable. A processor generates a first matrix, in which a row num...  
WO/2021/072502A1
A method for plasma ion processing is described, including flowing a gas into porous material; and exposing the gas to a pulsed electric field whilst the gas is in the pores. The pulsed electric field ionises the gas to generate a plasma...  
WO/2021/075465A1
[Problem] To provide a device, method, and program for three-dimensional reconstruction of a subject to be analyzed to generate a high-resolution three-dimensional image with minimized computational load. [Solution] A device for three-di...  
WO/2021/071357A1
The invention relates to a device for generating a plurality of charged particle beamlets, and an inspection, imaging or processing apparatus and method for using the same. The device subsequently comprises a charged particle source, a f...  
WO/2021/071586A1
Apparatus for a multi-source ion beam etching (IBE) system are provided herein. In some embodiments, a multi-source IBE system includes a multi-source lid comprising a multi-source adaptor and a lower chamber adaptor, a plurality of IBE ...  
WO/2021/069620A1
The invention provides a microwave plasma reactor (1) for manufacturing synthetic material via chemical vapor deposition, comprising: - a plasma enclosure (2) comprising a base plate (102), a top plate (108) and a side wall (104, 106) ex...  
WO/2021/069153A1
Disclosed herein is a method of determining a field of view, FOV, setting for an inspection tool having a configurable FOV, the method comprising: obtaining a process margin distribution of features on at least part of a substrate; obtai...  
WO/2021/071999A1
A system for performing a bevel cleaning process on a substrate includes a substrate support including an electrode and a plurality of plasma needles arranged around a perimeter of the substrate support. The plasma needles are in fluid c...  
WO/2021/072040A1
A component for use in a plasma processing chamber is provided. A component body is made of a conductive material. A first ceramic coating of a first ceramic material is on a surface of the component body, wherein the first ceramic coati...  
WO/2021/070340A1
The present invention makes it possible to observe a biochemical sample or a liquid sample conveniently with a high observation throughput, while reducing the risk of damage to a sample holder. A sample holder 101 for holding a sample in...  
WO/2021/070336A1
The present invention enables to hold reliably a liquid or gel sample with a sample holder, and improve the yield of observation with a charged particle beam device. A sample holder 101 includes: a first member 102 having a lid member 11...  
WO/2021/069728A1
A system and corresponding method for electron cryomicroscopy, comprising: a field-emission gun for generating an electron beam, the field-emission gun being energized, in use, to generate a 80 keV to 120 keV electron beam which is emitt...  
WO/2021/071659A1
Embodiments described herein relate to apparatus for radio frequency (RF) grounding in process chambers. In one embodiment, a heater is disposed in a substrate support. The heater is surrounded by a ground shield assembly. The substrate ...  
WO/2021/070338A1
Observation of biochemical samples and liquid samples that is easy and has high observation throughput is made possible while reducing the risk of damage to a sample holder. The sample holder for holding a sample has: a sample chamber ha...  
WO/2021/071167A1
A substrate processing device according to one embodiment of the present invention comprises: a process chamber; an upper electrode arranged on an upper part inside the processor chamber, and arranged to be spaced from the upper surface ...  

Matches 1 - 50 out of 68,200