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Matches 1 - 50 out of 13,500

Document Document Title
WO/2021/082385A1
A security inspection apparatus capable of adapting to a change in conveyance speed, and a control method for the same, pertaining to the field of security inspection. The apparatus comprises three portions, a base unit, a scanning unit,...  
WO/2021/082384A1
A self-adaptive security check apparatus based on conveying speed change, relating to the field of security check, and comprising three portions, i.e., a base unit, a scanning unit, and a speed measurement assembly. The base unit compris...  
WO/2021/083099A1
An extreme ultraviolet light source apparatus, comprising: an electron source (2), wherein the electron source (2) provides an electron beam; an injection section (3), wherein the injection section (3) accelerates the electron beam to fo...  
WO/2021/086799A1
Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a liquid sheet jet target are presented herein. A highly focused, short duration laser pulse is directed to a liquid sheet jet target. The...  
WO/2021/078646A1
Method for assessing a position of a patient with respect to an automatic exposure control chamber, AEC chamber (11, 12), for a medical exam, wherein a patient is positioned between an X-ray source and the AEC chamber (11, 12); comprisin...  
WO/2021/074043A1
A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and ap...  
WO/2021/073833A1
There is provided a container arranged to contain a waste product of a laser-produced plasma radiation source. The container comprises: a first portion which defines a chamber; and a second portion which at least partially defines an ent...  
WO/2021/073829A1
An optical modulator includes an acousto-optic assembly and a thermal management apparatus. The acousto-optic assembly includes: an acousto-optic material; a first side configured to receive an incident light beam; and a second side conf...  
WO/2021/073813A1
An EUV collector mirror has a reflecting surface (16) to reflect usable EUV light which impinges on the reflection surface (16) from a source region (17) to a subsequent EUV optics. The reflection surface (16) carries a pump light gratin...  
WO/2021/063722A1
A cleaning device (10) for a lithography apparatus, the cleaning device comprising: a radiation source (2) configured to supply decontamination radiation (8) capable of removing water or other contaminant from the surface of an optical c...  
WO/2021/063637A1
A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at...  
WO/2021/052813A1
Provided is a high-voltage tank (100) for accommodating electrical components with liquid filling, the high-voltage tank (100) being configured to be closed at least substantially liquid-tight, and the high-voltage tank (100) comprising ...  
WO/2021/044525A1
This X-ray generator is provided with an X-ray generation unit, a housing case housing the X-ray generation unit, and an insulating component disposed between the inner surface of the housing case and at least a part of the X-ray generat...  
WO/2021/043952A1
A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming ...  
WO/2021/044037A1
An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the sec...  
WO/2021/037437A1
The invention relates to an optical diffraction component (39) having a periodic grating structure profile. The arrangement of diffraction structures is such that a wavelength range around two different target wavelengths, which are diff...  
WO/2021/037435A1
An apparatus configured to determine the amount of fuel collected in a container, the fuel being used for generating an EUV radiation beam in an EUV radiation source. The apparatus comprises a force measuring device, and the force measur...  
WO/2021/028592A1
Disclosed is an apparatus and a method in which off-droplet measurements instead of on-droplet measurements of prepulse energy are used for pulse energy control. Prepulse energy is measured during an off-droplet nonexposure period and co...  
WO/2021/026968A1
A load for a Z-pinch driven fusion ignition target and a fusion energy target. A solid sleeve (1) comprises an own metal layer (11) and an insulating layer (12) covering the metal layer (11). Methods for covering the insulating layer (12...  
WO/2021/030192A1
Described are apparatus and methods of operation for three dimensional fluence modulation and scatter shielding for dedicated computed tomography (CT). Through the disclosed invention, the number of incident photons on the field of view ...  
WO/2021/024669A1
This X-ray generator comprises a power supply unit for applying a voltage to an electron gun. The power supply unit has: a first controller; a booster; an isolation transformer including a primary coil electrically connected to the first...  
WO/2021/008881A1
A method for imaging a sample (S) by means of an X-ray detector (D) is disclosed, comprising providing (10) an electron beam (112) interacting with a target (T) to generate X-ray radiation (120) emitted from an X-ray spot (122) on the ta...  
WO/2021/004717A1
A measurement system for use with a light amplification cavity comprises: an input optical element; an imaging system; and a detector. The input optical element is for receiving an input radiation beam and directing: a first portion of t...  
WO/2020/243739A1
A pressure regulator for an x-ray apparatus includes a piston housing having a recess formed therein and a piston seated in the recess. The piston is free to reciprocate, and define a variable volume chamber, within the recess. A circumf...  
WO/2020/242511A1
Embodiments of the disclosed system and method provide for generating a multiple- energy X-ray pulse. A beam of electrons is generated with an electron gun and modulated prior to injection into an accelerating structure to achieve at lea...  
WO/2020/239625A1
A fluid control device (100) includes a structure (120) defining a valve cavity, a first fluid port (135), a second fluid port (140), and a third fluid port (145) configured to be fluidly coupled to a hermetic interior (105) of a body; a...  
WO/2020/232558A1
A computed tomography (CT) scanning apparatus that includes a set of X-ray sources and a set of flat panel detectors with a set of source collimators and a set of detector collimators therebetween. The design of the openings of the set o...  
WO/2020/229254A1
An imaging system (202) includes an X-ray radiation source (210) configured to emit radiation that traverses an examination region. The imaging system further includes a controller (220). The controller is configured to control an X-ray ...  
WO/2020/224893A1
The invention provides a guiding device for guiding a linear movement or a rotational movement, which comprises a first body (10), a second body (20), which is arranged movably with respect to the first body, and at least one spring devi...  
WO/2020/225347A1
A target delivery system for an extreme ultraviolet light (EUV) source includes: a conduit including an exterior, an interior conduit region, and an end that defines an orifice. The interior conduit region is configured to receive a targ...  
WO/2020/225015A1
Apparatus for and method of controlling formation of droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a capill...  
WO/2020/177775A3
A gate-controlled X-ray combined machine head, comprising a housing (100), a transformer oil (101) being arranged in the housing (100), a high voltage direct current power supply unit (102), a low voltage direct current power supply unit...  
WO/2020/221709A1
A metrology apparatus includes: a diagnostic apparatus configured to interact a diagnostic probe with a current target at a diagnostic region before the current target enters a target space; a detection apparatus; and a control system in...  
WO/2020/216307A1
Disclosed are a method and a system for acquiring a radiological image. The method comprises: acquiring a control instruction for controlling an imaging device to image a scanned object; determining an adjustment parameter of a radiation...  
WO/2020/216950A1
A laser-produced plasma light source is provided. The laser-produced plasma light source includes a vacuum chamber (1) with a rotating target assembly (2) providing a target (3) in an interaction zone (4) with a pulsed laser beam (8) foc...  
WO/2020/212019A1
A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; where...  
WO/2020/214909A1
A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer s...  
WO/2020/205883A1
An extreme ultraviolet (EUV) light source includes: a vacuum vessel; a target material supply system that supplies targets to an interior of the vacuum vessel, the targets including a first target with an initial shape at an initial targ...  
WO/2020/200610A1
A radiation system configured to produce radiation and comprising a droplet generator (3) configured to produce a droplet of fuel traveling towards a plasma formation region, a laser system operative to generate a pre-pulse (PP) and a ma...  
WO/2020/201560A1
A method is provided for compensating the settings of a pulsed X-ray system. A current, voltage and intended pulse width settings are selected for the X-ray pulses to be provided. Then, the selected pulse width setting for the set voltag...  
WO/2020/201530A1
A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: • - a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a ...  
WO/2020/193103A1
There is provided a method of setting a filament demand in an x- ray apparatus. The x-ray apparatus has a filament (111), through which the passing of a heating current allows thermionic emission of electrons from the filament. The x-ray...  
WO/2020/191074A1
A laser wakefield acceleration (LWFA) induced electron beam system for cancer therapy and diagnostics. Example embodiments presented herein include one or more laser fibers, and an electron beam source within an individual one of the one...  
WO/2020/187617A1
Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system...  
WO/2020/178244A1
Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a co...  
WO/2020/177775A2
The present invention relates to a gate-controlled X-ray combined machine head, comprising a housing, a transformer oil being arranged in the housing, a high voltage direct current power supply unit, a low voltage direct current power su...  
WO/2020/178898A1
An X-ray tube (120) is provided with: a cathode (140) and an anode (150) sealed inside a vacuum envelope (121); and an ion-collecting conductor (130) attached to the vacuum envelope so as to contact the internal space of the vacuum envel...  
WO/2020/173677A1
Apparatus for and method of controlling formation of droplets used to generate EUV radiation. The droplet source includes a fluid exiting an nozzle and a sub-system having an electro-actuatable element producing a disturbance in the flui...  
WO/2020/173683A1
A target apparatus (300) for an extreme ultraviolet (EUV) light source includes a target generator, a sensor module (130), and a target generator controller (325). The target generator includes a reservoir (115) configured to contain tar...  
WO/2020/169349A1
An apparatus for an extreme ultraviolet (EUV) lithography system includes an optical modulation system including at least one optical element configured for placement on a beam path between the optical modulation system and a plasma form...  

Matches 1 - 50 out of 13,500