Title:
ポジ型光像形成性底面反射防止コーティング
Document Type and Number:
Japanese Patent JP2013507653
Kind Code:
A
Abstract:
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.
Inventors:
Dummel Ralph Earl
Chakra Pani Srinivasan
Patmanavan Munirasna
Miya Zaki Shinji
Energy Edward W
Takanori Kudo
Diocese Albert Dee
Howley Ann Francis M
Chakra Pani Srinivasan
Patmanavan Munirasna
Miya Zaki Shinji
Energy Edward W
Takanori Kudo
Diocese Albert Dee
Howley Ann Francis M
Application Number:
JP2012532672A
Publication Date:
March 04, 2013
Filing Date:
November 12, 2009
Export Citation:
Assignee:
AZ Electronic Materials USA Corporation
International Classes:
G03F7/11; C07C69/75; G03F7/004; G03F7/039; G03F7/38; H01L21/027; C09B67/46
Domestic Patent References:
| JP2008501985A | 2008-01-24 | |||
| JP2009107996A | 2009-05-21 | |||
| JP2004054286A | 2004-02-19 | |||
| JP2007536389A | 2007-12-13 |
Foreign References:
| US20090042133A1 | 2009-02-12 | |||
| WO2009097436A2 | 2009-08-06 |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Katsunori Uenishi
Ichiro Torayama
Blacksmith
Katsunori Uenishi
Ichiro Torayama