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Title:
【発明の名称】新規なジアゾジスルホン化合物
Document Type and Number:
Japanese Patent JP2500533
Kind Code:
B2
Abstract:
PURPOSE:To provide a novel diazodisulfone compound which generates an acid by the irradiation of KrF excimer laser beams, X rays, etc., and which has a large value on the formation of ultrafine patterns in a semiconductor industry, etc. CONSTITUTION:A compound of formula I (R1 is 3-8C branched or cyclic alkyl; R2 is 1-8C linear, branched or cyclic alkyl), e.g. bis(cyclohexyl sulfonyl) diazomethane. The compound has an excellent light transmitting property for far-UV rays, KrF excimer laser beams, ArF excimer laser beams, etc., readily generates an acid on the irradiation of light, electron beams, X rays, etc., and has excellent solution stability in resist materials. The compound of formula I is produced by reacting a compound of formula II with H2O2 and subsequently reacting the produced compound of formula III with tosylazide of formula IV in the presence of a base, the compound of formula II being produced by reacting a compound of formula RISH with CH2Cl2.

Inventors:
URANO FUMYOSHI
NAKAHATA MASAAKI
FUJE HIROTOSHI
OONO KEIJI
Application Number:
JP2956191A
Publication Date:
May 29, 1996
Filing Date:
January 30, 1991
Export Citation:
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Assignee:
WAKO PURE CHEM IND LTD
International Classes:
C07C381/14; G03F7/004; G03F7/039; H01L21/027; H01L21/30; (IPC1-7): C07C381/14; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JPH03223863A
JPH03103854A
Foreign References:
GB1231789A
Attorney, Agent or Firm:
平井 順二