Title:
高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4305637
Kind Code:
B2
Inventors:
Jun Hatakeyama
Wataru Kusagi
Takanobu Takeda
Wataru Kusagi
Takanobu Takeda
Application Number:
JP2003175034A
Publication Date:
July 29, 2009
Filing Date:
June 19, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F212/14; G03F7/039; C08F232/08; C08F234/02; H01L21/027
Domestic Patent References:
| JP2002202610A | ||||
| JP2003084440A | ||||
| JP2004061794A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Saori Shigematsu
Katsunari Kobayashi