Title:
ハーフトーン型位相シフトマスクブランク、ハーフトーン型位相シフトマスク、半導体装置の製造方法、およびハーフトーン型位相シフトマスクの修正方法
Document Type and Number:
Japanese Patent JP4325175
Kind Code:
B2
Inventors:
Takashi Haraguchi
Tadashi Matsuo
Toshihiro Ii
Tadashi Saga
Tadashi Matsuo
Toshihiro Ii
Tadashi Saga
Application Number:
JP2002323475A
Publication Date:
September 02, 2009
Filing Date:
November 07, 2002
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
G03F1/32; G03F1/68; G03F7/20; H01L21/027
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