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Patent Searching and Data


Title:
照射パターンデータ作成方法、マスク製造方法、及び描画システム
Document Type and Number:
Japanese Patent JP4378648
Kind Code:
B2
Abstract:
An irradiation pattern data generation method includes: a process for providing a design pattern having diagonal side portions that extend diagonally with respect to an X-axis direction and a Y-axis direction on an XY plane; a rectangular approximation process for approximating the design pattern to rectangles to generate a rectangular approximation pattern; a first correction process for shifting the side portions of the rectangular approximation pattern in the Y-axis direction to generate a first correction pattern; and a second correction process for enlarging the side portions of the first correction pattern in the X-axis direction and the Y-axis direction to generate an irradiation pattern.

Inventors:
安里 直生
Application Number:
JP2006274779A
Publication Date:
December 09, 2009
Filing Date:
October 06, 2006
Export Citation:
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Assignee:
エルピーダメモリ株式会社
International Classes:
G03F7/20; G03F1/76; G03F1/78; H01L21/027
Domestic Patent References:
JP5036595A
JP2003273001A
JP2003151885A
JP11307429A
JP8321450A
JP5198485A
JP4307723A
JP4026109A
Attorney, Agent or Firm:
工藤 実