Title:
不純物導入の制御方法
Document Type and Number:
Japanese Patent JP4447555
Kind Code:
B2
Abstract:
A method is provided for controlling a dose amount of dopant to be doped into an object to be processed in plasma doping. According to the method, the doping control is formed of the following processes: determining the temperature of the object, the amount of ions having dopant in plasma that collide with the object, and types of gases in plasma during doping; calculating a dose amount by neutral gas according to the temperature of the object, and a dose amount by ions from the determined amount of ions containing dopant that collide with the object; and carrying out doping so that the sum of the dose amount by neutral gas and the dose amount by ions equal to a predetermined dose amount.
Inventors:
Yuichiro Sasaki
Ichiro Nakayama
Tomohiro Okumura
Maejima Satoshi
Ichiro Nakayama
Tomohiro Okumura
Maejima Satoshi
Application Number:
JP2005513926A
Publication Date:
April 07, 2010
Filing Date:
September 06, 2004
Export Citation:
Assignee:
Panasonic Corporation
International Classes:
H01L21/265
Domestic Patent References:
| JP2000332252A | ||||
| JP2000114198A |
Attorney, Agent or Firm:
Shohei Oguri
Toshimitsu Ichikawa
Kimihide Hashimoto
Fumio Iwahashi
Hiroki Naito
Daisuke Nagano
Toshimitsu Ichikawa
Kimihide Hashimoto
Fumio Iwahashi
Hiroki Naito
Daisuke Nagano