Title:
液処理装置、液処理方法および記憶媒体
Document Type and Number:
Japanese Patent JP5031671
Kind Code:
B2
Abstract:
A liquid processing apparatus and method capable of separately collecting first and second processing liquids from each other, and preventing a formation of a defect (such as watermarks and particles) on a target substrate are disclosed. In one embodiment, the liquid processing apparatus includes a substrate holding device, a processing liquid supply device to supply a first processing liquid and a second processing liquid, a rotating cup, an outer discharge portion and an inner discharge portion to respectively discharge the first processing liquid and the second processing liquid received from the first receiving surface of the rotating cup, and a discharge portion switch device to open/close the outer discharge portion. The lower end of the first receiving surface of the rotating cup extends to a lower position than the position of the substrate held by the substrate holding device. The first processing liquid is discharged toward the outer discharge portion when the discharge portion switch device moves up, and the second processing liquid is discharged toward the inner discharge portion 16 when the discharge portion switch device moves down.
Inventors:
Takeshi Ara
Norihiro Ito
Norihiro Ito
Application Number:
JP2008145570A
Publication Date:
September 19, 2012
Filing Date:
June 03, 2008
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; B08B3/02; G02F1/13; G02F1/1333
Domestic Patent References:
| JP2002184660A | ||||
| JP2002329696A |
Attorney, Agent or Firm:
Kenji Yoshitake
Hiroyuki Nagai
Junpei Okada
Hirohito Katsunuma
Takuhisa Murata
Hiroyuki Nagai
Junpei Okada
Hirohito Katsunuma
Takuhisa Murata