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Title:
反射防止フィルムの製造方法、反射防止フィルム、偏光板、及び画像表示装置
Document Type and Number:
Japanese Patent JP5331919
Kind Code:
B2
Abstract:
The present invention can provide an antireflection film improved in the scratch resistance while having a sufficiently high antireflection property, and a polarizing plate and a display device using the antireflection film. The antireflection film comprises a transparent support, and as an outermost layer, a low refractive index layer containing a fluorine-containing polymer. The low refractive index layer comprises at least one inorganic fine particle having an average particle size of 30 to 100% of the thickness of the low refractive index layer. The inorganic particle is a silica fine particle, and at least one of the silica fine particles in the low refractive index layer is a hollow silica fine particle having a refractive index of from 1.17 to 1.40. Moreover, the hollow silica fine particle comprises an outer shell and a single vacancy inside the particle, and a porosity of the hollow silica fine particle defined by formula (VIII) is from 10 to 60%: x = 4 �¢ À �¢ a 3 / 3 / 4 �¢ À �¢ b 3 / 3 × 100 wherein a is a radius of the vacancy and b is the radius of the outer shell.

Inventors:
Shuntaro Ibuki
Naohiro Matsunaga
Application Number:
JP2012115609A
Publication Date:
October 30, 2013
Filing Date:
May 21, 2012
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G02B1/11; G02B5/02; B32B27/00; B32B27/08; B32B27/18; B32B27/30; G02B5/30; G02F1/1335; G02F1/13363; H01L51/50; H05B33/02; H05B33/14
Domestic Patent References:
JP2001343505A
JP2002265866A
JP200255205A
Attorney, Agent or Firm:
Takamatsu Takeshi
Toshiyuki Ozawa
Hasegawa Hiromichi



 
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