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Title:
ニッケル-リンの研磨方法
Document Type and Number:
Japanese Patent JP5508413
Kind Code:
B2
Abstract:
The invention is directed to a method of chemically-mechanically polishing a surface of a substrate, comprising contacting a surface of a substrate comprising nickel-phosphorous with a chemical-mechanical polishing composition comprising wet-process silica, an agent that oxidizes nickel-phosphorous, and an aminopolycarboxylic acid, wherein the polishing composition has a pH of about 1 to about 5, and abrading at least a portion of the nickel-phosphorous to polish the substrate.

Inventors:
Barrasbra Maniam, Bencatara Manang
Yun, Pin-Ha
Application Number:
JP2011517411A
Publication Date:
May 28, 2014
Filing Date:
July 06, 2009
Export Citation:
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Assignee:
CABOT MICROELECTRONICS CORPORATION
International Classes:
B24B37/00; H01L21/304; C09K3/14; G11B5/84
Domestic Patent References:
JP2007179612A
JP2001089746A
JP2008516465A
JP2005063530A
Foreign References:
WO2007126672A1
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Masaharu Konoue



 
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