Title:
リソグラフィシステムにおいて基板を搬送するための装置
Document Type and Number:
Japanese Patent JP5787331
Kind Code:
B2
Abstract:
An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.
Inventors:
Quiper, Vincent Sylvester
Slot, irwin
Juan Kelvin Cook, Marcel Nikolaas Jacobs
De Bois, Guido
De Yong, Hendrik Yang
Slot, irwin
Juan Kelvin Cook, Marcel Nikolaas Jacobs
De Bois, Guido
De Yong, Hendrik Yang
Application Number:
JP2014506912A
Publication Date:
September 30, 2015
Filing Date:
May 01, 2012
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01L21/677; B65G49/07; H01L21/027
Domestic Patent References:
| JP11121362A | ||||
| JP2003068600A | ||||
| JP3975164B2 | ||||
| JP4425801B2 | ||||
| JP5136247A | ||||
| JP9205127A |
Foreign References:
| US20100129182 | ||||
| US6573520 |
Attorney, Agent or Firm:
Kurata Masatoshi
Yoshihiro Fukuhara
Nobuhisa Nogawa
Takashi Mine
Katsu Sunagawa
Yoshihiro Fukuhara
Nobuhisa Nogawa
Takashi Mine
Katsu Sunagawa