Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
チャンバ装置および極端紫外光生成装置
Document Type and Number:
Japanese Patent JP5876711
Kind Code:
B2
Abstract:
A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.

Inventors:
永井 伸治
藤本 准一
芦川 耕志
Application Number:
JP2011251786A
Publication Date:
March 02, 2016
Filing Date:
November 17, 2011
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ギガフォトン株式会社
International Classes:
H05G2/00
Domestic Patent References:
JP2010123928A
JP2010199560A
JP2010538420A
Foreign References:
US20110226745
Attorney, Agent or Firm:
保坂 延寿
新井 信昭
酒井 宏明