Title:
原盤、原盤の製造方法、及び凹凸フィルム
Document Type and Number:
Japanese Patent JP6685128
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a novel and improved matrix capable of producing an uneven film having improved handleability; and to provide a production method of a matrix, and an uneven film.SOLUTION: A matrix includes, from some point of view of this invention, a matrix base material, a plurality of first recesses formed on the surface of the matrix base material and extended in a first direction, and a plurality of second recesses formed on the surface of the matrix base material and extended in a second direction intersecting the first direction, in which a bottom surface of at least either recess of the first recess and the second recess is a curved surface.SELECTED DRAWING: Figure 1
Inventors:
Katsuhiro Doi
Application Number:
JP2015254596A
Publication Date:
April 22, 2020
Filing Date:
December 25, 2015
Export Citation:
Assignee:
Dexerials Co., Ltd.
International Classes:
B29C59/02; B29C33/38; B29C33/42; B29C59/04; G02B1/04
Domestic Patent References:
| JP2007112989A | ||||
| JP2015153797A | ||||
| JP2015092576A |
Other References:
小池哲弘,硬質・離型性分散めっき「セパプレート」の開発,日本金属学会会報,第31巻第5号(1992)
Attorney, Agent or Firm:
Aomi patent office