Title:
近接露光装置及び近接露光方法
Document Type and Number:
Japanese Patent JP6705666
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus and proximity exposure method capable of improving exposure accuracy by performing control such that an in-plane gap distribution between a mask and a substrate becomes uniform based on the flatness of the mask and the flatness of a work chuck which are previously measured.SOLUTION: A control device 100 for controlling a vertical fine adjusting device 8 controls the vertical fine adjusting device 8 so as to achieve the most uniform possible gap distribution G between a mask M and a workpiece mounting plane 2a based on a difference C (η)-S (ξ) between an undersurface of the mask M and the workpiece mounting plane 2a at a plurality of measurement points P1-P25 obtained from the height coordinates C (η) of the undersurface of the mask M and the height coordinates S (ξ) of the workpiece mounting plate 2a which are measured previously at the plurality of measurement points P1-P25 on a peripheral part and interior part of the patterned mask M.SELECTED DRAWING: Figure 1
Inventors:
Kawashima Hironori
Application Number:
JP2016043588A
Publication Date:
June 03, 2020
Filing Date:
March 07, 2016
Export Citation:
Assignee:
Buoy Technology Co., Ltd.
International Classes:
G03F7/20; H01L21/68
Domestic Patent References:
| JP2012133122A | ||||
| JP2011164595A | ||||
| JP2014192162A | ||||
| JP2004342900A | ||||
| JP2003177550A |
Foreign References:
| US4618261 | ||||
| CN102193346A |
Attorney, Agent or Firm:
Patent business corporation glory patent office