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Title:
スパッタリングターゲット及びその製造方法、並びに磁気記録媒体の製造方法
Document Type and Number:
Japanese Patent JP7005647
Kind Code:
B2
Abstract:
The present disclosure provides a sputtering target containing one or more metals of Fe, Co, Cr, and Pt, and one or more of C and BN, with less generation of particles, and a method for producing the same. A sputtering target including: one or more metallic phases selected from a group consisting of Fe, Co, Cr, and Pt; and one or more nonmetallic phases selected from a group consisting of C and BN, wherein the sputtering target satisfies: A≤40, and A/B≤1.7 in which A represents the number of boundaries between the metallic phases and the nonmetallic phases on a line segment having a length of 500 μm drawn in a vertical direction, in a structure photograph; and B represents the number of boundaries between the metallic phases and the nonmetallic phases on a line segment having a length of 500 μm drawn in a horizontal direction, in the structure photograph.

Inventors:
Shinichi Ogino
Application Number:
JP2019549027A
Publication Date:
February 14, 2022
Filing Date:
September 28, 2018
Export Citation:
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Assignee:
JX Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/34; B22F1/052; B22F3/14; B22F3/15; C22C1/05; C22C5/04; C22C27/06; C22C30/00; C22C30/02; C22C38/00; C23C14/06; G11B5/65; G11B5/851
Domestic Patent References:
JP2012102387A
JP2012178211A
JP2018035434A
JP2003303787A
JP5331635A
Foreign References:
WO2014132746A1
WO2018047978A1
WO2015080009A1
Attorney, Agent or Firm:
Axis International Patent Business Corporation