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Title:
ABRASIVE MATERIAL
Document Type and Number:
Japanese Patent JPH04246492
Kind Code:
A
Abstract:

PURPOSE: To improve abrasion resistance by burying abrasive granules in a specific porous polyurethane resin matrix.

CONSTITUTION: A diol component [e.g. a mixture of a diol contg. polyorganosiloxyl groups with poly(hexamethylene carbonate) diol], a diisocyanate (e.g. isophorone diisocyanate) in an ant. contg. excess NCO groups, and, if necessary, a chain extender (e.g. isophoronediamine) are reacted at 30-120°C for 1-10hr, and the reaction product is, if necessary, molded to give a porous polyurethane resin matrix having a number-average mol.wt. of 5000-100,000, polyorganosiloxyl groups in the side chains of the molecule, the number of repeating units in the group of 10-1000, and a content of the group of 0.1-50 pts.wt. based on 100 pts.wt. solid polyurethane resin. Abrasive granules (e.g. silicone dioxide abrasive granules) are buried in the matrix to give an abrasive material.


Inventors:
TSUKANO TATSURO
AIZAWA HIROYUKI
Application Number:
JP1192991A
Publication Date:
September 02, 1992
Filing Date:
February 01, 1991
Export Citation:
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Assignee:
DAINIPPON INK & CHEMICALS
International Classes:
B24D3/32; C09K3/14; (IPC1-7): B24D3/32; C09K3/14
Attorney, Agent or Firm:
Takahashi victory



 
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