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Title:
ACTIVE GAS GENERATING DEVICE AND FORMING METHOD FOR OXIDE HIGH TEMPERATURE SUPERCONDUCTIVE THIN FILM USING THIS DEVICE
Document Type and Number:
Japanese Patent JPH0585703
Kind Code:
A
Abstract:

PURPOSE: To provide an active gas generating device which can be easily handled and shows enough oxidization power in high vacuum and to provide a forming method of oxide-type high temp. superconductive thin film.

CONSTITUTION: This active gas generating device is equipped with a cylindrical discharge tube 1 having a small hole at one end and the coil 2 of a conductor which is wound around the discharge tube. Gas is injected through the hole 1a provided at one end of the discharge tube 1 while HF current is applied on the coil 2 to change the gas into plasma. The length (L) of the discharge tube 1, length (Lc) of the area where the coil 2 is wound around the discharge tube 1, and the mean free path of electrons (λe) are specified to satisfy the relation of L>Lc+2λe. An oxide-type high temp. superconductive thin film is formed with using this device in high vacuum.


Inventors:
TONO YASUSHI
UMEZAWA TOSHIMASA
MIZOBUCHI KATSUO
Application Number:
JP1992000023867
Publication Date:
April 06, 1993
Filing Date:
February 10, 1992
Export Citation:
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Assignee:
YOKOGAWA ELECTRIC CORP
International Classes:
B01J7/00; B01J19/08; C01B13/02; C01B13/14; C01G1/00; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): B01J7/00; B01J19/08; C01B13/02; C01B13/14; C01G1/00; H01B12/06; H01B13/00; H01L39/24
Attorney, Agent or Firm:
Shinsuke Ozawa