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Title:
ALIGNER AND EXPOSURE SYSTEM USING THE SAME
Document Type and Number:
Japanese Patent JPH021902
Kind Code:
A
Abstract:

PURPOSE: To restrain the decline in detection beam intensity for enhancing the position detecting precision by a method wherein, as for the irradiating beams of the first lattice pattern, the zero dimensional beams emitted in case of irradiating the second lattice pattern are used.

CONSTITUTION: The beams 8 emitted from a laser oscillator 7 are reflected by a mirror 6 to irradiate the second lattice pattern 5 on the second substrate 4 for emitting the ± primary reflected diffracting beams 9, 9' to a detection optical system through the intermediary of the mirror 6. The zero dimensional diffracting beams 11 and the ± primary beams 12, 12' out of the transmission diffracting beams are emitted to the first substrate 1 through a contraction projecting lens 3. The lens 3 is subjected to the aberration from the pattern detecting optical wavelength on the wafer side so that the zero dimensional diffracting beams 11 only may irradiate the first lattice pattern 2 not to make the resultant ± primary reflected diffracting beams 10, 10' focus on the substrate 4 due to the aberration from the pattern detecting optical system. Through these procedures, the detection beam intensity can be augmented to enhance the detecting precision.


Inventors:
KATAGIRI SOUICHI
KUROSAKI TOSHISHIGE
TERASAWA TSUNEO
KATAOKA KEIJI
Application Number:
JP14370888A
Publication Date:
January 08, 1990
Filing Date:
June 13, 1988
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01B11/00; G03F9/00; H01L21/027; H01L21/30; (IPC1-7): G01B11/00; G03F9/00; H01L21/027; H01L21/30
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)



 
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