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Patent Searching and Data


Title:
ALIGNMENT METHOD OF MASK IN LASER MASK REPAIR
Document Type and Number:
Japanese Patent JPH10122817
Kind Code:
A
Abstract:

To attain automatic alignment when the defect of a contact hole formed in a mask is corrected.

A reticle 6 in which a contact hole is formed is irradiated with a laser beam 15 and an illumination light from a light source 9, via a variable slit 10. The reticle 6 is sensed by a CCD camera 3. On the basis of the obtained image data, a control device 2 adjusts the slit 10 in such a manner that the size and the position of the slit image coincide with the size and the position of a normal contact hole, and controls an XY stage 7 in such a manner that the center position of the slit image coincides with that of a contact hole having defect to be corrected.


Inventors:
SHIMANAKA TETSUYA
Application Number:
JP1996000273672
Publication Date:
May 15, 1998
Filing Date:
October 16, 1996
Export Citation:
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Assignee:
NEC CORP
International Classes:
G01B11/00; G01B11/02; G01B11/24; G01N21/88; G01N21/93; G01N21/956; G03F1/72; H01L21/027; (IPC1-7): G01B11/00; G01B11/02; G01B11/24; G01N21/88; G03F1/08; H01L21/027
Attorney, Agent or Firm:
若林 忠