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Title:
ANTIMICROBIAL POLYAMIDE COMPOSITION EXCELLENT IN LIGHT RESISTANCE
Document Type and Number:
Japanese Patent JPH0782473
Kind Code:
A
Abstract:

PURPOSE: To obtain an antimicrobial polyamide composition excellent in both of antimicrobial properties and light resistance and useful for wool for wadding, etc., by combinedly using an inorganic antimicrobial agent having silver ion and an organic light stabilizer having a specific structure.

CONSTITUTION: This composition is obtained by blending (A) an inorganic antimicrobial agent supporting a silver ion thereon with (B) a hindered amine- based light stabilizer. Furthermore, the blend amount of the component B is 0.1-3.0wt.% and as the component B, a component having a halogen atom on a triazine ring, e.g. 2-chloro-4, 6-bis(4-amino-2,2,6,6-tetramethylpiperidyl)-1, 3, 5triazine, etc., is preferably used.


Inventors:
FUJIWARA SHIRO
MINEMATSU HIROMASA
Application Number:
JP22886493A
Publication Date:
March 28, 1995
Filing Date:
September 14, 1993
Export Citation:
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Assignee:
TEIJIN LTD
International Classes:
C08K3/08; C08K5/17; C08K5/3492; C08L77/00; (IPC1-7): C08L77/00; C08K3/08; C08K5/17; C08K5/3492
Attorney, Agent or Firm:
前田 純博



 
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