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Patent Searching and Data


Title:
ANTIREFLECTION FILM COMPOSITION FOR MICROLITHOGRAPHY AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JPH0862835
Kind Code:
A
Abstract:

To provide a material suitable for an antireflection film, used in microlithography by far-UV light.

A copolymer of benzophenone and bisphenol A is known to have far-UV absorptivity. Then, the copolymer is useful particularly as the antireflection film in the field applying microlithography. The absorption at 248nm is intensified, when anthracene is introduced into the copolymer. The terminalstopping agent used for the copolymer is widely changeable according to the need of a user and is so selectable as to promote adhesiveness, stability and absorption of different wavelengths.


Inventors:
JIEEMUSU TOMASU FUAHEI
BURAIAN UEIN HAABUSUTO
REO ROORENSU RENEHAN
UEIN MAATEIN MOROO
GARII TOMASU SUPINITSURO
KEBUIN MAIKERU UERUSHIYU
ROBAATO RABUIN UTSUDO
Application Number:
JP1995000190296
Publication Date:
March 08, 1996
Filing Date:
July 26, 1995
Export Citation:
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Assignee:
IBM
International Classes:
G03F7/004; C08G65/40; C08G67/00; C09D171/00; G03F7/09; G03F7/11; H01L21/027; (IPC1-7): G03F7/004; C08G67/00; G03F7/11; H01L21/027
Attorney, Agent or Firm:
合田 潔 (外2名)