Title:
APPARATUS FOR FULLY AUTOMATIC PRODUCTION OF SEMICONDUCTOR DEVICE AND LIQUID CRYSTAL PANEL
Document Type and Number:
Japanese Patent JP3314982
Kind Code:
B2
Abstract:
PURPOSE: To provide the apparatus for fully automatic production of semiconductor devices and liquid crystal panels which produces these semiconductor devices and liquid crystal panels without the aid of man power once wafers and glass substrates are charged into the apparatus before these wafers and substrates are ejected as the semiconductor devices and liquid crystal panels from the apparatus and takes the remedy for particle contamination and molecule contamination including the storage device before shifting to the ensuing stage into consideration.
CONSTITUTION: This apparatus include plural vacuum treating sections V7 to V15 for executing treatments in a vacuum state and plural atm. pressure treating sections A7 to A15 for executing treatments in an atm. pressure state and includes transporting means V1, A1, etc., for automatically transporting objects to be treated between the vacuum treating sections, between the atm. pressure treating section and between the vacuum treating sections and atm. pressure treating sections. The objects to be treated are automatically subjected to various kinds of the treatments by carrying the objects into the apparatus, by which the semiconductor devices and liquid crystal panels are produced.
Inventors:
Shuhei Shinozuka
Satoshi Mori
Koji Ono
Masao Matsumura
Satoshi Mori
Koji Ono
Masao Matsumura
Application Number:
JP13301993A
Publication Date:
August 19, 2002
Filing Date:
May 10, 1993
Export Citation:
Assignee:
Ebara Corporation
International Classes:
G02F1/13; B65G49/00; B65G49/06; B65G49/07; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B65G49/00; B65G49/06; B65G49/07; G02F1/13
Domestic Patent References:
| JP4275449A |
Attorney, Agent or Firm:
Takashi Kumagai (1 outside)