Title:
SILICONE-NOVOLAK COPOLYMER AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3155783
Kind Code:
B2
Abstract:
PURPOSE: To obtain a silicone novolak block copolymer suitable for silicone flexibilizer effective for reducing stress of semiconductor element sealing material by subjecting a specific polysiloxane and a specific phenol novolak resin to polyaddition reaction.
CONSTITUTION: (A) A polysiloxane (preferably polysiloxane obtained from 1,1,3,3- tetramethyldisiloxane as a starting raw material) shown by formula I (R1 and R2 or substituted or nonsubstituted 1-3C alkyl or phenyl; k is 0-200) containing SiH groups at both ends and (B) a phenol novolak resin containing allyl groups at both ends, preferably a phenol novolak resin shown by formula II (R3 is 1-4C alkyl; R4 is 1-4C alkyl or alkoxyl; m is ≥2) are subjected to polyaddition reaction by hydrosilylation reaction in a molar ratio of 1:1-5:1 by using a catalyst (preferably platinum-based catalyst, especially chloroplatinic acid) in a solvent to give a silicone novolak multi-block copolymer shown by formula III (n is ≥2).
Inventors:
Ryoichi Ikezawa
Ken Nanami
Shinsuke Hagiwara
Ken Nanami
Shinsuke Hagiwara
Application Number:
JP24650791A
Publication Date:
April 16, 2001
Filing Date:
September 02, 1991
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
C08G77/42; C08G81/00; (IPC1-7): C08G77/42; C08G81/00
Domestic Patent References:
| JP5993729A | ||||
| JP326712A |
Attorney, Agent or Firm:
Tetsuo Hodaka