Title:
基板処理装置
Document Type and Number:
Japanese Patent JP7056972
Kind Code:
B2
Abstract:
To prevent interference between a function part and a substrate as well as effectively functioning the function part.SOLUTION: An elevating body 33 is arranged between a first rotational axis 42 and a second rotational axis 44 above a conveyance reference surface 18, and is maintained at a predetermined downward position with respect to a conveyance reference surface 18 while both of first and second rollers 31 and 32 are not ridden on an upper surface of a substrate 1, and is maintained so as to be lifted to the upward from the downward position by the rotational axis of each roller ridden on the upper surface of the substrate while at least one of the first and second rollers 31 and 32 is ridden on the upper surface of the substrate 1. Elevating direction regulation means 35 and 36 regulate an elevating direction of the elevating body 33 when elevating it from the downward position to an appropriate vertical direction with respect to the conveyance reference surface 18. A function part 50 is fixedly provided to the elevating body 33 so that the elevating body 33 is positioned above the conveyance reference surface 18 in a state where it is dropped at the downward position, and functions so as to be opposite from the upward to the upper surface of the substrate 1 in the middle of the conveyance.SELECTED DRAWING: Figure 8
Inventors:
Masanori Akiyama
Tatsuhiko Matsuo
Tetsuya Katata
Tatsuhiko Matsuo
Tetsuya Katata
Application Number:
JP2020097667A
Publication Date:
April 19, 2022
Filing Date:
June 04, 2020
Export Citation:
Assignee:
Chemtron Co., Ltd.
International Classes:
H05K3/06; B65G13/00; B65G13/04; B65G13/12
Domestic Patent References:
| JP2017133078A | ||||
| JP201382975A | ||||
| JP200918410A | ||||
| JP2005322779A | ||||
| JP2015118969A | ||||
| JP58189660U | ||||
| JP57124840U |
Foreign References:
| GB2288381A |
Attorney, Agent or Firm:
Naoshi Yoneyama
Matsuura Masaaki
Matsuura Masaaki