Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023001098
Kind Code:
A
Abstract:
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a resin, and a resist composition containing the same.SOLUTION: There are provided a carboxylate having a specific structure, a carboxylic acid generator, and a resist composition. A resist pattern can be produced with good line edge roughness (LER) by using the resist composition containing the carboxylate having a specific structure.SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022098222A
Publication Date:
January 04, 2023
Filing Date:
June 17, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C69/54; C07C381/12; C07D321/10; C08F220/10; C09K3/00; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation