Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020152719
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.SOLUTION: The carboxylate represented by formula (I), a carboxylic acid generator, and the resist composition containing the same are provided. [In the formula, R1, R2 and R3 each represent a halogen atom, a C1-12 fluorinated alkyl group or a C1-12 alkyl group, provided that -CH2- contained in the alkyl group may be substituted with -O- or -CO-; m1 represents an integer of 0-5; m2 represents an integer of 0-3; m3 represents an integer of 0-4; and X0 represents an optionally substituted C1-72 hydrocarbon group, provided that -CH2- contained in the hydrocarbon group may be substituted with -O-, -S-, -CO- or -SO2-.]SELECTED DRAWING: None
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Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020040926A
Publication Date:
September 24, 2020
Filing Date:
March 10, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D333/76; C07C62/24; C07D317/30; C07D317/72; C07D319/06; C07D319/08; C07D321/10; C07D339/06; C07D339/08; C07D407/12; C08F8/12; C08F20/18; C08F212/14; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation