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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM EXPOSING SYSTEM AND METHOD FOR MEASURING QUANTITY OF CONTAMINATION ON MASK FOR EXPOSURE
Document Type and Number:
Japanese Patent JP2001358046
Kind Code:
A
Abstract:

To propose a charged particle beam exposing system and an inspection method by which the degree of contamination on a mask for exposure in the charged particle beam exposing system using an electron beam, etc., can be inspected uniformly and accurately.

This charged particle beam exposing system is provided with a means for measuring the quantity of contamination on a mask for exposure, which comprises an exciting light source to emit an exciting light for measurement to the surface of the mask for exposing a charged particle beam, a spectrophotometer which receives scattered lights obtained correspondingly from the exciting light emitted from the exciting light source and analyzes them spectroscopically, and a contamination detector which outputs an analysis result while corresponding to the quantity of contamination adhered to the mask. Every part is preferably made to correspond to Raman spectroscopic analysis.


Inventors:
EMA TAKAHIRO
Application Number:
JP2000000175480
Publication Date:
December 26, 2001
Filing Date:
June 12, 2000
Export Citation:
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Assignee:
NEC CORP
International Classes:
G01N21/65; G01N21/88; G01N21/956; G03F7/20; G21K5/00; G21K5/04; H01L21/027; (IPC1-7): H01L21/027; G01N21/65; G01N21/88; G01N21/956; G03F7/20; G21K5/00; G21K5/04
Attorney, Agent or Firm:
桂木 雄二