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Title:
CHARGED PARTICLE BEAM LITHOGRAPHY
Document Type and Number:
Japanese Patent JPH0629198
Kind Code:
A
Abstract:

PURPOSE: To simultaneously expose a wide area and to make a beam current density uniform by applying a high voltage to a blanking electrode and applying a low voltage of a fine voltage gap to a deflecting electrode for varying its size in an apparatus for forming a variable size beam bundle by using first and second slits.

CONSTITUTION: The charged particle beam lithography comprises blanking electrodes 34, 34' and blanking slit 35 provided in a front stage of a slit 38 to control ON, OFF a beam from an electron gun 31. A high voltage is applied to the electrodes 34, 33', deflected by a large amplitude to the slit 35. A lower fine voltage step than the high voltage applied to the electrode is applied to deflecting electrodes 41, 41' and 44, 44' to be accurately varied in sizes and shapes. Thus, a uniform high beam current density is used as a light source to obtain a beam graphic of arbitrary shape.


Inventors:
WASHIMI MASAHIKO
Application Number:
JP1993000100072
Publication Date:
February 04, 1994
Filing Date:
April 05, 1993
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Domestic Patent References:
JPS52115249A1977-09-27
Attorney, Agent or Firm:
則近 憲佑



 
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