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Patent Searching and Data


Title:
CLEANING METHOD FOR GLASS COATING REACTOR
Document Type and Number:
Japanese Patent JP2004060054
Kind Code:
A
Abstract:

To provide a method for cleaning a glass coating vessel using a reactive gas.

The cleaning method for a glass coating reactor comprises: a stage (a) wherein a reactor to be cleaned comprising a chamber with at least one kind of substance selected from the group consisting of Si3N4 and SiO2 deposited on the inner surface, is prepared; a stage (b) wherein the flow of a deposition gas to the reactor is substantially stopped; a stage (c) wherein at least one kind of gas for cleaning is added to the reactor, and is allowed to react with the at least one kind of substance to produce at least one kind of volatile product; and a stage (d) wherein the at least one kind of volatile product is removed from the reactor, cleaning the reactor.


Inventors:
PHILLIP BRUCE HENDERSON
MONIZ MARIO JOSEPH
JOHNSON ANDREW DAVID
KARWACKI EUGENE JOSEPH JR
BODETTE RICHARD R
CORDING CHRISTOPHER ROBERT
JOHNSON HERBERT DAVID
Application Number:
JP2003000199789
Publication Date:
February 26, 2004
Filing Date:
July 22, 2003
Export Citation:
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Assignee:
AIR PROD & CHEM
International Classes:
C23C14/00; C23C16/44; (IPC1-7): C23C16/44; C23C14/00
Attorney, Agent or Firm:
青木 篤
石田 敬
古賀 哲次
永坂 友康
西山 雅也