Title:
CLEANING SHEET AND METHOD FOR CLEANING SUBSTRATE TREATMENT APPARATUS USING THE SHEET
Document Type and Number:
Japanese Patent JP3740004
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a cleaning sheet for a substrate treatment apparatus to be shielded from the contamination such as a production apparatus and an inspection device such as a semiconductor, a flat panel display and a printed board, and a method for cleaning the apparatus.
SOLUTION: A cleaning sheet in which the Vickers hardness of its cleaning layer is at least 10, a cleaning sheet in which the surface free energy of its cleaning layer is at least 20 mJ/m2, a cleaning sheet in which an adhesive layer is formed on one side of its cleaning layer, a cleaning sheet in which a cleaning layer at least 10 in Vickers hardness is formed at least on one side of its support, and a cleaning sheet in which an adhesive layer is formed on the other side are provided.
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| WO/2021/224841 | IMPROVED MULTI-PURPOSE CLEANING SYSTEM |
Inventors:
Ryo Namikawa
Yoshio Terada
Yoshio Terada
Application Number:
JP2000243752A
Publication Date:
January 25, 2006
Filing Date:
August 11, 2000
Export Citation:
Assignee:
NITTO DENKO CORPORATION
International Classes:
B08B1/00; B08B6/00; H01L21/304; (IPC1-7): B08B6/00
Domestic Patent References:
| JP10154686A | ||||
| JP8203857A |
Attorney, Agent or Firm:
祢▲ぎ▼元 邦夫
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