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Title:
CLEANING TREATMENT DEVICE FOR CASSETTE AND WAFER
Document Type and Number:
Japanese Patent JPH05198545
Kind Code:
A
Abstract:

PURPOSE: To make it possible to clean a cassette which houses a wafer and house the wafer in a clean state.

CONSTITUTION: There is provided a cassette cleaning treatment section 8 separately from a wafer cleaning treatment section 5. The cassette cleaning treatment section is provided with a dry cleaning tank 11 which applies ultraviolet rays to a cassette, a cleaning solution tank 14 where the cassette is submerged after the cassette is irradiated and a pure water cleaning tank 16 which rinses the cassette with pure water. A holding section 18 which holds the cleaned cassette is installed to the outlet of the wafer cleaning treatment section. The wafer cleaning treatment section 5 cleans wafers one by one and transfers to the outlet. The cleaned wafers are immediately housed in the cleaned cassettes in the holding section 18.


Inventors:
DOI KIMIO
HIRUMA HISAO
Application Number:
JP1992000029912
Publication Date:
August 06, 1993
Filing Date:
January 22, 1992
Export Citation:
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Assignee:
ENYA SYST KK
International Classes:
H01L21/304; (IPC1-7): H01L21/304
Domestic Patent References:
JPS6333824A1988-02-13
JPH04249320A1992-09-04
Attorney, Agent or Firm:
Kiyoko Inoue (1 person outside)



 
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