Title:
CLEANING WATER FOR ELECTRONIC MATERIAL ITS REPARATION, AND CLEANING OF ELECTRONIC MATERIAL
Document Type and Number:
Japanese Patent JP3940967
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a cleaning water for electronic materials which can clean, in a small amt., electronic materials, such as silicone substrates for semiconductors and glass substrates for liquid crystals, contaminated with fine particles, in an efficient manner with high percentage removal of contaminants.
SOLUTION: This cleaning water for electronic materials comprises ultrapure water having a dissolved hydrogen concn. of not less than 0.7 mg/liter to not more than the saturated concn. and a pH value of 6 to 12. The process for preparing the cleaning water for electronic materials comprises deaerating ultrapure water, feeding hydrogen gas through a gas permeable membrane, and further, adding an alkali. The method for cleaning electronic materials comprises bringing an electronic material contaminated with fine particles into contact with the cleaning water for electronic materials while applying ultrasonic waves.
Inventors:
Hiroshi Morita
Tetsuo Mizuba
Junichi Ida
Tetsuo Mizuba
Junichi Ida
Application Number:
JP19778297A
Publication Date:
July 04, 2007
Filing Date:
July 08, 1997
Export Citation:
Assignee:
Kurita Water Industries Ltd.
International Classes:
B08B3/12; C11D7/02; B01D19/00; B01D53/22; H01L21/304; (IPC1-7): C11D7/02; B01D19/00; B01D53/22; B08B3/12; H01L21/304
Domestic Patent References:
| JP9010713A | ||||
| JP8126873A | ||||
| JP9024350A | ||||
| JP5138167A | ||||
| JP2265604A | ||||
| JP7263430A | ||||
| JP4058528A | ||||
| JP10064867A |
Attorney, Agent or Firm:
Mitsuru Uchiyama
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