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Title:
COATING PROCESSING METHOD, PROGRAM, COMPUTER STORAGE MEDIUM AND COATING PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2015099809
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To form a coating film with a desired shape on the outer periphery of a substrate.SOLUTION: In a coating processing method for forming a coating film on the outer peripheral edge of a wafer W on which shots S of a pattern are formed, a coating liquid is supplied to the wafer W through a coating nozzle supplying the coating liquid while a nozzle head 33 including the nozzle is scanned along the outside of shots Sn of a pattern at the outermost peripheral part of the wafer W. An ink jet nozzle or a capillary nozzle is used as the coating nozzle.

Inventors:
TAKAYANAGI YASUHARU
TERASHITA YUICHI
FUJIMOTO AKIHIRO
Application Number:
JP2013237559A
Publication Date:
May 28, 2015
Filing Date:
November 18, 2013
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/027; B05C9/12; B05C9/14; B05C11/00; B05C11/10; B05D1/26
Domestic Patent References:
JP2013054128A2013-03-21
JP2012160735A2012-08-23
JP2003038993A2003-02-12
JP2004146651A2004-05-20
JP2005211767A2005-08-11
JP2003112098A2003-04-15
Attorney, Agent or Firm:
Tetsuo Kanamoto
Miaki Kametani
Koji Hagiwara
Naoki Ogita