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Title:
CYLINDER STOP POSITION VARIABLE MECHANISM AND SUBSTRATE TREATING APPARATUS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2009054630
Kind Code:
A
Abstract:

To provide a means for moving up and down a semiconductor substrate or a mounting table therefor scarcely imparting vibration thereto and which is capable of freely changing the vertical stop position in moving up and down in a treating apparatus for the semiconductor substrate.

This cylinder stop position variable mechanism comprises, in a cylinder having a piston and a shaft and driving at a fluid pressure, a stopper which penetrates and locking the shaft, a pair of limiters for stopping the advance and retract of the piston by abutting the stopper, and a limiter moving mechanism for making the limiter position variable. Further, the limiter moving mechanism is controlled by a motor, the limiter moving mechanism is provided for each of the pair of limiters, and each limiter can be subjected to position control independently.


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Inventors:
HAYASHI DAISUKE
NONAKA TATSU
Application Number:
JP2007217119A
Publication Date:
March 12, 2009
Filing Date:
August 23, 2007
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/205; H01L21/68; H01L21/3065
Attorney, Agent or Firm:
Masao Tanaka