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Patent Searching and Data


Title:
DEPOSITED FILM FORMING DEVICE
Document Type and Number:
Japanese Patent JPS62230978
Kind Code:
A
Abstract:

PURPOSE: To efficiently form a deposited film having uniform and good quality at a low cost with a simple device by releasing gas for forming the deposited film from spiral gas releasing pipes provided in a deposited film forming chamber.

CONSTITUTION: A cylindrical substrate 103 heated by a halogen lamp 104 to a prescribed temp. in the deposition space 105 of the deposited film forming chamber 101 evacuated to a vacuum through a discharge pipe 106 is rotated by a driving device 110 via a supporter 108 and a revolving shaft 109. The spiral gas releasing pipes 102a, 102b having gas releasing holes are disposed to enclose the substrate 103. The gaseous raw material for forming the deposited film and the gaseous halogen oxidizing agent having the property to make an oxidation effect thereto supplied respectively through gas supply pipes 112, 113 are released from the gas releasing pipes 102a, 102b. The above-mentioned both gases are thereby brought into contact and reaction with each other to form the deposited film on the surface of the substrate 103.


Inventors:
SHIRAI NAOKO
TAKEI TETSUYA
AOIKE TATSUYUKI
Application Number:
JP1986000073104
Publication Date:
October 09, 1987
Filing Date:
March 31, 1986
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L31/0248; C23C16/24; C23C16/30; C23C16/32; C23C16/44; C23C16/455; H01L21/205; (IPC1-7): C23C16/24; C23C16/30; C23C16/32; C23C16/44; H01L21/205; H01L31/08