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Patent Searching and Data


Title:
DEPOSITION METHOD FOR DIELECTRIC LAYER AND PRODUCTION OF OPTICAL INFORMATION MEDIUM
Document Type and Number:
Japanese Patent JPH10308042
Kind Code:
A
Abstract:

To produce an optical information medium having excellent recording and erasing characteristics and an excellent overwriting characteristic by depositing a dielectric layer contg. a mixture composed of ZnS and silicon nitrooxide in a gaseous mixture atmosphere composed of an inert gas and oxygen or the inert gas, oxygen and nitrogen by a sputtering method using a target contg. the mixture composed of the ZnS and silicon nitride.

An under-coating layer 3 is formed on a disk-shaped transparent substrate 1 having guide grooves 2 by the sputtering using the gaseous mixture formed by adding 0.5 to 10% O2 to Ar for the target consisting of the mixture of 90:10 in the mixing ratio of the ZnS and Si3N4. A recording layer 4 is formed on the under-coating layer 3 and an over-coating layer 5 is deposited by the same method as the method for the under-coating layer 3 on the recording layer 4. Further, a reflection layer 6 is formed and is provided with a protective substrate 8 via an adhesive 7. As a result, the optical information medium with which the change in the recording and erasing characteristics is suppressed and the thermal stability of the recording signals after overwriting cycles is improved is obtd.


Inventors:
ISOMURA HIDEMI
OTA HIROYUKI
ONO EIJI
Application Number:
JP11409497A
Publication Date:
November 17, 1998
Filing Date:
May 01, 1997
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
C23C14/34; G11B7/26; (IPC1-7): G11B7/26; C23C14/34
Attorney, Agent or Firm:
Masamichi Matsuda