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Title:
ELECTRIC CHARGE PARTICLE BEAM IRRADIATION SYSTEM
Document Type and Number:
Japanese Patent JP2018020163
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an electric charge particle beam irradiation system capable of shortening an irradiation time of an electric charge particle beam to an irradiation object.SOLUTION: The electric charge particle beam irradiation system includes: an electric charge particle beam generating device which accelerates an electric charge particle beam; an irradiation device 5 which emits the accelerated electric charge particle beam to a plurality of irradiation spots; a beam dose measurement device 59 which obtains a dose of the electric charge particle beam passing in the irradiation device 5; and a beam position measurement device 58 which obtains both or either the position and/or the width of the electric charge particle beam. The beam position measurement device 58 obtains both or either the position and/or the width of the electric charge particle beam per irradiation spot and determines whether it is within an acceptable range. Furthermore, it obtains both or either the position and/or the width of the electric charge particle beam per split and determines whether it is within an acceptable range regarding splits set by dividing all or a part of the plurality of irradiation spots into a plurality of irradiation sections to manage the dose.SELECTED DRAWING: Figure 2

Inventors:
ITO TOMONORI
MATSUDA KOJI
SHINAGAWA RYOSUKE
TADOKORO MASAHIRO
NISHIMURA ARAO
Application Number:
JP2017189399A
Publication Date:
February 08, 2018
Filing Date:
September 29, 2017
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
A61N5/10
Domestic Patent References:
JP2008237687A2008-10-09
JP2014028310A2014-02-13
JP2011177374A2011-09-15
Foreign References:
WO2013027263A12013-02-28
WO2013108393A12013-07-25
Attorney, Agent or Firm:
Yuji Toda