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Title:
ELECTROLESS GOLD PLATING SOLUTION
Document Type and Number:
Japanese Patent JPH03294484
Kind Code:
A
Abstract:

PURPOSE: To prepare an electroless gold plating soln. stable to impurity metal ions by adding aminophosphonic acids to an electroless gold plating soln. contg. Au ions, a complexing agent for Au ions and a reducing agent.

CONSTITUTION: At least one of aminophosphonic acids such as aminomethylphosphonic acid, iminophosphonic acids such as ethylenediiminobisisopropylphosphonic acid or the sodium, potassium or ammonium salts of the acids is added to an electroless gold plating soln. in about 1-20 molar ratio to ions of impurity metals such as Cu, Ni and Fe. The plating soln. contains Au ions, a complexing agent for Au ions such as thiosulfuric acid and a reducing agent such as sodium hypophosphite. The decomposition of the plating soln. due to impurity metal ions is prevented and the stability is remarkably improved.


Inventors:
OKUDAIRA HIROAKI
ANDO SETSUO
KASHIMURA TAKASHI
MURAYAMA NOBUYASU
SHIMAZAKI TAKESHI
TOMIZAWA AKIRA
Application Number:
JP9646190A
Publication Date:
December 25, 1991
Filing Date:
April 13, 1990
Export Citation:
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Assignee:
HITACHI LTD
HITACHI CHEMICAL CO LTD
International Classes:
C23C18/44; (IPC1-7): C23C18/44
Domestic Patent References:
JPS503742A1975-01-16
JPS63137178A1988-06-09
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)