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Title:
ELECTROSTATIC ATTRACTER
Document Type and Number:
Japanese Patent JPH0794576
Kind Code:
A
Abstract:

PURPOSE: To obtain an electrostatic attracter in which partial delamination is prevented by forming a low resistance electrostatic attracting part in the center on the attracting face and forming a high resistance electrostatic attracting part at least partially on the periphery of the attracting face.

CONSTITUTION: The electrostatic attractor comprises an attraction electrode 2 embedded at least partially in an insulator 1, and a mechanism 6 for delaminating a support 4 being attracted onto the attracting face of the insulator 1 by applying high voltage to the attraction electrode 2. In such electrostatic attracter, a low resistance electrostatic attracting part for storing true charges of leak current from the attraction electrode 2 on the attracting face and generating Johnson-Rahback force is formed in the center of the attracting face. A high resistance electrostatic attracting part, in which the attracting force disappears upon application of voltage to the attraction electrode 2, is formed at least partially on the periphery of the attracting face. Outer periphery of the insulator 1 is composed of a high resistance disc insulator 1b, for example, and the central parts of the insulator 1 is composed of a low resistance disc insulator 1a.


Inventors:
HASEGAWA AKIHIRO
Application Number:
JP23377093A
Publication Date:
April 07, 1995
Filing Date:
September 20, 1993
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
B23Q3/15; H01L21/027; H01L21/68; H01L21/683; H02N13/00; (IPC1-7): H01L21/68; B23Q3/15; H01L21/027; H02N13/00
Attorney, Agent or Firm:
Teiichi



 
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