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Patent Searching and Data


Title:
ETCHING OF WINDOW HAVING DIFFERENT DEPTH
Document Type and Number:
Japanese Patent JPH03138934
Kind Code:
A
Abstract:
PURPOSE: To provide a method with which an integrated circuit having windows of different depths can be manufactured by selectively depositing a conductive material on the bottom of a first window and etching a dielectric substrate so as to open a second window deeper than the first window, and then further exposing part of a substrate. CONSTITUTION: In a method for etching windows having different depths, windows having different depths are opened so as to expose selected parts of a substrate 1. In the method, a planar layer 11 of a dielectric substance is formed on the substrate 1, and in order to expose part of the substrate 1, a first window is formed by etching the dielectric material layer 11. Then a second window is partially formed by etching the dielectric substance 11, and a conductive material 23 is deposited on the bottom of the first window. In addition, the dielectric substance 11 is etched until the second window is completely opened, namely, the part of the substrate 1 is exposed. Consequently, an integrated circuit composed of a gate electrode 3, source and drain areas 5, a field oxide area 7, and a gate runner 9 on the area 7 and has windows of different depths can be manufactured.

Inventors:
CHII YUAN RU
Application Number:
JP27249490A
Publication Date:
June 13, 1991
Filing Date:
October 12, 1990
Export Citation:
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Assignee:
AMERICAN TELEPHONE & TELEGRAPH
International Classes:
H01L21/302; H01L21/28; H01L21/306; H01L21/3065; H01L21/311; H01L21/336; H01L21/768; H01L29/78; (IPC1-7): H01L21/28; H01L21/302; H01L21/306; H01L21/336; H01L29/784
Attorney, Agent or Firm:
Masao Okabe (1 person outside)