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Title:
EXHAUST SYSTEM OF GASEOUS REACTION VESSEL FOR FORMING PLASMA-POLYMERIZED FILM REPLICA
Document Type and Number:
Japanese Patent JPS6421079
Kind Code:
A
Abstract:

PURPOSE: To minimize the deposition of the crystal of ice on the surfaces of the cooled analyte, cathode, and cutter block by providing a supplementary vacuum vessel, etc., to rapidly depressurize the inside of a gaseous reaction vessel.

CONSTITUTION: The exhaust system of the vacuum vessel 10 is composed of a roughing vacuum pump 20 connected to the reaction vessel 10 through a first valve 1, a high-vacuum pump 30, the second valve 2 and third valve 3 arranged before and behind the pump 30, the supplementary vacuum vessel 50, and the fourth valve 4 and fifth valve 5 arranged before and behind the vessel 50. The pump 30 is arranged between the reaction vessel 10 and the pump 20 in parallel with the valve 1. The vacuum vessel 50 is arranged between the reaction vessel 10 and the roughing vacuum pump 20 in parallel with the pump 30, valve 1, and valve 2.


Inventors:
TANAKA AKIRA
Application Number:
JP1987000174922
Publication Date:
January 24, 1989
Filing Date:
July 15, 1987
Export Citation:
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Assignee:
USHIO ELECTRIC INC
International Classes:
C23C16/50; C23C14/24; G01N1/28; H01J37/18; (IPC1-7): C23C16/50; H01J37/18