Title:
FILM AND METHOD FOR PRODUCING FILM
Document Type and Number:
Japanese Patent JP2022115898
Kind Code:
A
Abstract:
To provide a film, a method for production the film, use of the film to be applied to a target base material, and a method for producing an electric function element.SOLUTION: A film 1 comprises a carrier base material 2, an adhesion promoting layer 4 for applying the film 1 to a target base material, and at least one conductive layer 3. On at least the one conductive part 3, an electric function structure is formed in a function area 21. On at least the one conductive part 3, at least one contact structure for coming into contact with the electric function structure is formed in at least one contact area 20. The adhesion promoting layer 4, when vertically viewed to a plane along which the carrier base material 2 extends, does not cover at least the one contact area 20 in at least a prescribed area, or is applied to the entire surface.SELECTED DRAWING: Figure 1a
Inventors:
MATTHIAS HEINRICH
ANDREAS HIRSCHFELDER
MARTIN HAHN
JOHANNES SCHAD
ANDREAS HIRSCHFELDER
MARTIN HAHN
JOHANNES SCHAD
Application Number:
JP2022072951A
Publication Date:
August 09, 2022
Filing Date:
April 27, 2022
Export Citation:
Assignee:
LEONHARD KURZ STIFTUNG & CO KG
International Classes:
G06F3/041; B29D7/01; B32B7/025; G06F3/044; H01B5/14
Attorney, Agent or Firm:
Cleo International Law & Patent Office
Previous Patent: Novel anti-PD-L1 antibody
Next Patent: RF coil device and RF shield device for different MRI modes
Next Patent: RF coil device and RF shield device for different MRI modes