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Title:
FILM FORMING METHOD
Document Type and Number:
Japanese Patent JPS56121629
Kind Code:
A
Abstract:

PURPOSE: To form a film of uniform physical properties and thickness on a substrate with good reproducibility and high efficiency at high speeds by matching the direction of an electric field and the direction of a magnetic filed in a pressure-decreased depositing chamber.

CONSTITUTION: A substrate such as film sheet 117 or the like is set in a depositing chamber 103, and the inside of the chamber 103 is evacuated to a prescribed degree of vacuum. Thence, a prescribed kinds of gas is introduced through a main valve 104 into said chamber and voltage is impressed across electrodes 110, 111 to form an electric field in the space region where the sheet 117 exists, thereby forming the plasma atmosphere of the gas. The plasmas are concentrated uniformly in the prescribed space region efficiently by the magnetic field formed by the permanent magnet 119 installed behind the electrode 110. In this case, the direction of the electric field formed and the direction of the magnetic field are made substantially the same. This method offers the improved speed of film formation, the increased density of the plasmas and the uniformalized formation of the film.


Inventors:
KITAJIMA NOBUO
HAZEMOTO YOSHIKI
OONO SHIGERU
Application Number:
JP2587580A
Publication Date:
September 24, 1981
Filing Date:
February 29, 1980
Export Citation:
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Assignee:
CANON KK
International Classes:
C01B33/04; B01J19/08; C23C16/50; C23C16/52; C30B25/02; G03G5/08; H01J37/32; H01L21/205; (IPC1-7): B01J19/08; C01B33/04; C23C11/00; C30B25/00; H01L21/20



 
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