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Title:
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2012156557
Kind Code:
A
Abstract:

To provide a fluid handling system which maintains liquid in a space between a final element and a substrate of a projection system.

A fluid handling structure has a plurality of openings acting as a meniscus pinning system operating on a gas drag principle and a gas knife outside of the meniscus pinning system to break up any film of liquid left behind. The separation between the gas knife and the meniscus pinning system is selected from the range of 1 mm to 5 mm. Desirably, the underside of a barrier member in which the gas knife and the meniscus pinning system are provided is continuous, e.g. has no openings, between the gas knife and the meniscus pinning system.


Inventors:
RIEPEN MICHAEL
KEMPER NICOLAAS R
Application Number:
JP2012113151A
Publication Date:
August 16, 2012
Filing Date:
May 17, 2012
Export Citation:
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Assignee:
ASML NETHERLANDS BV
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
JP2008147652A2008-06-26
Foreign References:
US0008021A1851-04-01
US0008021A1851-04-01
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki