Title:
FOCUS POSITION ADJUSTMENT METHOD AND INSPECTION METHOD
Document Type and Number:
Japanese Patent JP2015138207
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a focus position adjustment method whose focus position adjustment accuracy can be prevented from deteriorating due to diffracted light, and to provide an inspection method that can perform a correct inspection by preventing deterioration in focus position adjustment accuracy due to the diffracted light.SOLUTION: A sample 9 is illuminated with light from a light source 1, and a light intensity distribution of a pupil of an illumination optical system a is observed with a sensor 26. When an influence of diffracted light due to a change in the focus position does not matter, a focus position is detected using the light. On the other hand, when an amount of diffracted light incident upon sensors 27, 28, 29, and 30 varies depending upon the focus position as a result of the observation of the light intensity distribution of the pupil of the illumination optical system a by the sensor 26, the focus position is detected using light from a light source 2. Then, a position in a Z-direction of a stage 31 is adjusted so that the detected focus position is located in a pattern surface of the sample 9.
Inventors:
NAGAHAMA HIROYUKI
OGAWA TSUTOMU
OGAWA TSUTOMU
Application Number:
JP2014010839A
Publication Date:
July 30, 2015
Filing Date:
January 23, 2014
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
G02B7/28; G03B15/00; G03F1/84
Domestic Patent References:
JP2008233342A | 2008-10-02 | |||
JPH09133856A | 1997-05-20 |
Attorney, Agent or Firm:
Atsuko Oaku
Hajime Yamashita
Hajime Yamashita