Title:
FUNCTIONAL STRUCTURE AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP2000117880
Kind Code:
A
Abstract:
To provide a functional structure keeping physical and chemical characteristics of a fiber or a film like article and excellent in antistaining, deodorizing, antibacterial and antifungal capacities due to photocatalytic reaction and a method for producing the same.
A functional structure is characterized by that a plasma polymn. film is formed on the surface of a base material and a photocatalyst semiconductor layer is formed on the surface of the plasma polymn. film and produced by forming the plasma polymn. film on the surface of the base material and subsequently bonding a photocatalyst semiconductor to the surface of the film.
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Inventors:
SEKI MASAO
Application Number:
JP29396398A
Publication Date:
April 25, 2000
Filing Date:
October 15, 1998
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
B32B9/00; D06M10/02; D06M11/00; D06M11/46; (IPC1-7): B32B9/00; D06M10/02; D06M11/46
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