Title:
GAS SUPPLY APPARATUS FOR EXCIMER LASER OSCILLATOR AND GAS SUPPLY
Document Type and Number:
Japanese Patent JP3782151
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To enable removal of impurities adsorbed on inner surfaces of pipes by making it difficult for a supply gas concentration to drop, and to enable supply of a constant gas pressure to each of a plurality of main lines by making it difficult for a gas purity to drop during a non-actuation period.
SOLUTION: In the gas supply apparatus for supplying a fluorine gas to an oscillator 31, a fluorination passive film is provided on fluorine gas contact surfaces. A chromium oxide passivity film is provided on the fluorine gas contact surfaces. A plurality of main lines 111a having a plurality of branch lines 21 communicating with a plurality of oscillators 31 communicate at their supply and termination ends with common lines 111b and 111c respectively. At the termination ends, purging is carried out always at a flow rate of 1cc/min.
Inventors:
Tadahiro Ohmi
Yasuyuki Shirai
Satoshi Mizogami
Naoto Sano
Yasuyuki Shirai
Satoshi Mizogami
Naoto Sano
Application Number:
JP4932896A
Publication Date:
June 07, 2006
Filing Date:
March 06, 1996
Export Citation:
Assignee:
Canon Inc
Japan Air Gases Ltd.
Tadahiro Ohmi
Japan Air Gases Ltd.
Tadahiro Ohmi
International Classes:
H01S3/036; H01S3/225; (IPC1-7): H01S3/225; H01S3/036
Domestic Patent References:
| JP2175855A | ||||
| JP4302185A | ||||
| JP7201812A | ||||
| JP2179867A |
Attorney, Agent or Firm:
Hisao Fukumori