Title:
GLASS SUBSTRATE TREATING DEVICE, GLASS SUBSTRATE TREATING SYSTEM AND GLASS SUBSTRATE TREATING METHOD
Document Type and Number:
Japanese Patent JP2007085702
Kind Code:
A
Abstract:
To provide a glass substrate treating device miniaturizable in outline by shortening a heat treating time of a glass substrate to reduce the storage number of glass.
The glass substrate treating device 1 has a heating chamber 2 whose six sides are covered with heat insulating walls 3 formed of a well-known heat insulating material. An exhaust duct 21 is mounted to the heating chamber 2. The exhaust duct 21 is connected to the top face of the heating chamber 2. A substrate placing member 30 and a plurality of halogen heaters 31 are provided in the heating chamber 2. The glass substrate 32 is heated mainly by the halogen heaters 31.
Inventors:
KANDA TOSHIRO
NAGANO YUKIO
ASHIDA KENJI
NAGANO YUKIO
ASHIDA KENJI
Application Number:
JP2005278272A
Publication Date:
April 05, 2007
Filing Date:
September 26, 2005
Export Citation:
Assignee:
ESPEC CORP
International Classes:
F27B9/36; F27B9/10; F27B9/24; F27D7/04; F27D11/02; G02F1/13
Attorney, Agent or Firm:
Takashi Fujita