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Title:
HIGH-FREQUENCY INDUCTION COIL INTEGRATED CRUCIBLE, AND METHOD OF REMOVING BORON AND PHOSPHOR FROM METAL SILICON USING THE CRUCIBLE
Document Type and Number:
Japanese Patent JP2014154388
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a device and method that enables consecutive processing by a compact device configuration, and that can efficiently remove boron and phosphor from metal silicon at a low cost.SOLUTION: A high-frequency induction coil integrated crucible 10 is used. In the crucible 10, a coil 11 is configured by rectangular or circular horizontal winding. An upper side 11a of the coil is arranged in a horizontal direction or in an inclined manner, in an axial direction D of the coil, and a lower side 11b of the coil is arranged in a stepwise manner so as to have one or more valley bottoms E to the horizontal direction of the coil. A part toward the valley bottoms E is inclined. A silicon material is brought into a molten metal state by adding an oxidant, and forces F are acted to the molten metal S in the valley V from both sides so as to cross each other, and thereby, a strong stirring action is generated. In addition, because a temperature can be raised high enough to melt SiO2, and because self lining is possible, boron and phosphor can be efficiently removed at a low cost without a special crucible.

Inventors:
OKA HIROAKI
OKA NARIAKI
Application Number:
JP2013023523A
Publication Date:
August 25, 2014
Filing Date:
February 08, 2013
Export Citation:
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Assignee:
SANKI DENGYO KK
International Classes:
H05B6/24; C01B33/037; F27B14/06; F27D11/06; H01L31/06
Domestic Patent References:
JP2001324276A2001-11-22
JPS49101209A1974-09-25
JP2005255417A2005-09-22
Attorney, Agent or Firm:
Shintaro Hotta